Copper--Fundamental Mechanisms for MicroelectronicApplications
Rights Contact Login For More Details
- Wiley
More About This Title Copper--Fundamental Mechanisms for MicroelectronicApplications
English
SHYAM P. MURARKA, PhD, is a professor in the Department of Materials Science and Engineering at the Rensselaer Polytechnic Institute, Troy, New York.
IGOR V. VERNER, PhD, is a professor at Moscow Institute of Electronic Technology (MIET) in Russia.
RONALD J. GUTMANN, PhD, is a professor in the Department of Electrical, Computer, and Systems Engineering at Rensselaer Polytechnic Institute, Troy, New York.
IGOR V. VERNER, PhD, is a professor at Moscow Institute of Electronic Technology (MIET) in Russia.
RONALD J. GUTMANN, PhD, is a professor in the Department of Electrical, Computer, and Systems Engineering at Rensselaer Polytechnic Institute, Troy, New York.
English
Overview of IC Interconnects.
Behavior of Copper Impurity Atoms.
Copper-Related Defects in Silicon.
Chemistry and Electrochemistry.
Copper in Inorganic Dielectrics.
Copper in Organic Dielectrics (Polymers).
Diffusion and Compound Formation.
Layered Structures Containing Copper.
Copper for IC Metallization.
Future Directions in Copper Technology.
Appendix.
Index.
Behavior of Copper Impurity Atoms.
Copper-Related Defects in Silicon.
Chemistry and Electrochemistry.
Copper in Inorganic Dielectrics.
Copper in Organic Dielectrics (Polymers).
Diffusion and Compound Formation.
Layered Structures Containing Copper.
Copper for IC Metallization.
Future Directions in Copper Technology.
Appendix.
Index.
